U.S.-China IP Summit
5th Annual U.S.-China IP Summit
November 14-15, 2016 | China Renmin University, Shenzhen, China
The annual U.S.-China IP Summit draws professionals from business, legal and entertainment industries who want to hear from prominent speakers and experts from both the US and China about cutting edge intellectual property and related issues. The conference is co-hosted by Loyola Law School, UC Berkeley Center for Law and Technology and China Renmin University IP Academy. China Renmin University IP Academy is proud to be the hosting site for the 2016 conference.
This year's Summit will draw attendance from policymakers, judges, and practitioners from around the world to discuss five important topics: (1) Recent Developments in Trade Secrets Law; (2) Privacy Protection in the Information Age; (3) Recent Developments in Entertainment Law; (4) Patent Commercialization; and (5) Brand Protection.
Click HERE to see the conference agenda and full list of speakers.
Recent press coverage of 5th Annual U.S.-China IP Summit:
2016: Renmin University IP Academy